Source of combined ion-electron beam with full current compensation PP203
PURPOSE AND SCOPE
Wide - aperture and low - energy source of combined ion - electron beam which is designed for reactive ion beam processing of micro - and nanostructures in microelectronic technologies, for ion - beam polishing, deposition of thin films, as well as for conducting fundamental research in the field of plasma physics and charged beam physics particles. The results of the work may be realized in scientific organizations of physical and the technical profile and directly at the enterprises that make modern science - intensive products.
THE DEVELOPMENT READINESS STATUS
Wide - aperture and low - energy sources of combined ion - electron beam. Now it works successfully in Kharkiv National University named by V. N. Karazin and at the Open Society NPP "Saturn.
MAIN CHARACTERISTICS OF THE DEVELOPMENT
The source provides the generation of a combined beam ions and electrons in diameter of 250 mm (diameter of the zone processing 200 mm) with the possibility of independent ion energy management in the range 50 - 500 eV and the current density of ions in the range 0. 5 - 6 mA / cm2 at the output of the ion - optical system.
Application ion - optical system with high - frequency shift ensures the possibility of simultaneous extraction positive ions and electrons. In all modes full beam current compensation is ensured. The source is adapted for long - term operation using chemically active gases, containing fluorine.
Development is in demand in the Ukrainian market and other countries.
INTELLECTUAL PROPERTY STATUS
A patent of Ukraine and Russia were received.